Chromium Sputtering Targets and Evaporable Cathodes
01
Description
02
specifications
Chromium products are applied in various physical deposition processes of thin films and functional coatings (PVD) in the production of electronic components, displays, tools, vacuum chroming of watch cases, household appliance parts, working surfaces of hydraulic and pneumatic cylinders, spools, rods, tinted glass, mirrors, car parts and accessories, and other machines and devices.
When ionized plasma hardening coatings are deposited onto a tool by vacuum-arc evaporation of the cathode or magnetron sputtering of targets, chromium is used as an adhesive sublayer and, when combined with other materials, it helps create multilayer and nanostructured multifunctional wear-resistant coatings. High-quality ERCr large-size planar targets are used by leading manufacturers of plasma and LCD displays for deposition of metal conductors while making thin-film transistors (TFT) in monitor arrays
Production flow:
ERCr flakes → powder → compacted ingot → chromium target
Special treatment of our powder allows us to ensure material purity equal to that of the initial chromium material.
Compacting methods include:
- hot isostatic pressing (HIP);
- hot pressing - extrusion (HP);
- if necessary, rolling of sintered ingots (R).
Finish machining parameters are agreed with customers.
Unless otherwise specified, the tolerances are as below, in mm:
for diameters ± 0,25;
for thickness ± 0,2;
for width and length up to 100 ± 0,15; 100 - 500 ± 0,25; 500 - 1000 ± 0,4; over 1000 ± 1,0.
03
advantages
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Profound production experience
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Strict quality control of all produced materials
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In-house research laboratory
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Flexible discount system
04
Product names
Names of chromium targets:
ERCr 99.9-PM;
ERCr 99.95-PM;
ERCr 99.97-PM;
ERCr 99.99-PM
You can contact our sales managers for more details at:
export_polema@metholding.com,
tel.: +7(4872)25-06-76.
05
chemical composition
Chemical composition (specified) of chromium targets:
Shape and sizes of chromium targets:
| Name |
Cr, %, min |
Impurities, ppm, max | ||||||||
|
O |
N | C | S | Fe | Si | Ni | Al | Cu | ||
|
ERCr 99.9-PM |
99,9 | 350 | 100 | 200 | 30 | 500 | 100 | 100 | 70 | 40 |
|
ERCr 99.95-PM |
99,95 | 200 | 50 | 100 | 20 | 250 | 50 | 40 | 30 | 30 |
|
ERCr 99.97-PM |
99,97 | 100 | 50 | 70 | 20 | 100 | 20 | 10 | 20 | 20 |
| ∑ metal impurities Al, Fe, Cu, Ni, Si, Ca, K, Li, Mg, Mn, Mo, Na, Pb, Ti, W, Zn, etc. 300 ppm, max | ||||||||||
|
ERCr 99.99-PM |
99,99 | 100 | 50 | 70 | 20 | 50 | 10 | 5 | 5 | 10 |
| ∑ metal impurities Al, Fe, Cu, Ni, Si, Ca, K, Li, Mg, Mn, Mo, Na, Pb, Ti, W, Zn, etc. 100 ppm, max | ||||||||||
Shape and sizes of chromium targets:
| Shape of machined targets | Diameter, mm | Thickness, mm | Width, mm | Length, mm |
| plate | - | 5 - 50 | 1400 max | 1700 max |
| disc, ring | 65 - 400 | 5 - 50 | - | - |
| cylinder | 15 - 65 | - | - | 600 max |
06
miscellaneous
JSC POLEMA is the world's largest producer of electrolytic chromium, unique in purity.
Applications vary from metallurgy of heat–resistant superalloys, electrical engineering in compositions with copper, and deposition of thin films and functional coatings using PVD methods, to production of electronic components, large-format displays, tools, watch cases, household appliances, tinted glasses, car parts and accessories, machines and appliances, as well as others.
In thin-film deposition in vacuum by means of thermal evaporation electrolytic refined chromium is used in flake or granule form, by means of ion bombardment spraying or arc evaporation – in the form of various compacted products. For target production by powder metallurgy (PM) methods chromium ERCr in flake form is mechanically ground into MP-ERCr powder.
Applications vary from metallurgy of heat–resistant superalloys, electrical engineering in compositions with copper, and deposition of thin films and functional coatings using PVD methods, to production of electronic components, large-format displays, tools, watch cases, household appliances, tinted glasses, car parts and accessories, machines and appliances, as well as others.
In thin-film deposition in vacuum by means of thermal evaporation electrolytic refined chromium is used in flake or granule form, by means of ion bombardment spraying or arc evaporation – in the form of various compacted products. For target production by powder metallurgy (PM) methods chromium ERCr in flake form is mechanically ground into MP-ERCr powder.
07
Application areas